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| Thermodynamic Analysis of Chemical Vapor Deposition Process for High Purity Titanium |
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| DOI：doi：10.3969/j.issn.1007-7545.年份.期号.顺序号 |
| KeyWord:CVD |
| CHEN Xiao-hu,LIU Yi-min |
| College of Materials Science and Metallurgical Engineering;Guizhou University;Guiyang 550003;China |
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| Abstract: |
| The high purity titanium is obtained with raw titanium and halogen by chemical vapor deposition process.Thermodynamic analyses for Chemical Vapor Deposition(CVD) process of high purity titanium are made,and the results of the analyses are optimized.The influence of the temperature of deposition on deposition rate of titanium especially is summarized.During the chemical vapor deposition process of high purity titanium,the best temperature ranges of source area and deposition area are 750~850 K and 1 350~1 45... |
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