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| Synthesis of a Novel Silica-supported Chelating Resin and Its Properties for Copper Removal |
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Received:May 01, 2012
Revised:May 02, 2012
Accepted:May 03, 2012
Published Online:August 20, 2012
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| DOI：doi：10.3969/j.issn.1007-7545.2012.09.002 |
| KeyWord:cobalt electrolyte; copper removal; chelating resin synthesis; adsorption property |
| Author | Institution |
| TAN Ping |
湖南机电职业技术学院 |
| HU Hui-ping |
中南大学化学化工学院 |
| BAI Lan |
中南大学化学化工学院 |
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| Abstract: |
| Silica gel was silanized with (3-chloropropyl) triethoxy silane and then grafted with polyethyleneimine (PEI) to obtain Si-PEI with silica as raw materials. To follow, a new adsorbent Si-AMP was synthesized through functionalization of Si-PEI with 2-chloromethyl pyrrole for copper removal from cobalt electrolyte. The surface of the adsorbent was characterized by means of FT-IR and elemental analysis. The resort indicates that the modification of silica surface is successfully performed. The adsorption characters of Si-AMP for Cu2 , Ni2 , Co2 are investigated through pH effect, adsorption dynamics and separation coefficient. The maximum adsorption capacities are 0.35 mmol/g, 0.25 mmol/g and 0.22 mmol/g for Cu2 , Ni2 and Co2 , respectively, when the pH value of solution is 3.8. From the static adsorption experiment, the separation coefficient of Cu/Co is 3 167, and the concentration of Cu2 is less than 1 mg/L in the simulated cobalt electrolyte after purification. |
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