Improvement on Rectification Process of Polycrystalline Silicon by Improved Siemens Process
Received:March 13, 2013   Revised:March 14, 2013   Accepted:March 15, 2013      Published Online:August 22, 2013
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DOI:10.3969/j.issn.1007-7545.2013.09.015
KeyWord:polycrystalline silicon; Siemens process; impurity; rectification; process; improvement
           
AuthorInstitution
liugang 青海黄河上游水电开发有限责任公司新能源分公司
qinrong 青海黄河上游水电开发有限责任公司新能源分公司、中国科学院青海盐湖研究所
liushengzhang 青海黄河上游水电开发有限责任公司新能源分公司、中国科学院青海盐湖研究所
wangshuya 青海盐湖研究所
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Abstract:
      Improved Siemens process was widely used by polycrystalline silicon manufacturers home and abroad. The trichlorosilane distillation process comprised of three rectification towers was improved. The results show that boron and phosphorus contents in trichlorosilane are further reduced by improved four rectification towers distillation process. The purity of final product of high-purity trichlorosilane can reach 99.999%.
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