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| Process Optimization for Titanium Purification by Chemical Vapor Deposition |
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Received:April 14, 2014
Revised:April 17, 2014
Accepted:April 18, 2014
Published Online:August 21, 2014
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| DOI：10.3969/j.issn.1007-7545.2014.09.007 |
| KeyWord:CVD; halogenation process; high purity titanium; orthogonal test |
| Author | Institution |
| Wang-Rui |
贵州大学材料与冶金学院 |
| TANG Xiao-ning |
贵州大学材料与冶金学院 |
| Chen Xiao-hu |
贵州大学材料与冶金学院 |
| Li-Jiwei |
贵州大学材料与冶金学院 |
| LI Ming-xin |
贵州大学材料与冶金学院 |
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| Abstract: |
| The optimal process conditions of titanium purification by thermal decomposition of titanium iodides were studied by orthogonal experiment. The results show that the effecting sequence on productivity of high purity titanium presents as temperature of halogenation area, diameter of base section, dosage of halogenating agent, and temperature of thermal decomposition area. The optimum conditions include dosage of halogenating agent of 600 g, diameter of base section of 6 mm, temperature of halogenation area of 200~700 ℃ and thermal decomposition area of 1 100~1 300 ℃. Obtained under optimum conditions remelted with electron beam (EB), purity of products can reach 99.998%. |
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