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| Study of Electrodeposit Ihrigizing in NaCl-KCl-NaF-SiO2 Molten Salt |
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Received:May 04, 2014
Revised:May 13, 2014
Accepted:May 13, 2014
Published Online:October 15, 2014
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| DOI：10.3969/j.issn.1007-7545.2014.11.006 |
| KeyWord:NaCl-KCl-NaF-SiO2 molten salt; silicon; electrodeposition; Si; Mo-MoSi2 gradient material |
| Author | Institution |
| He Xiao-feng |
河北联合大学 唐山 中国 |
| Li Yun-gang |
河北联合大学 唐山 中国 |
| Li Zhi-hui |
河北联合大学 唐山 中国 |
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| Abstract: |
| Mo-MoSi2 gradient material was prepared by ihrigizing on molybdenum matrix with silicon electrodeposited in KCl-NaCl-NaF-(SiO2) molten salt as silicon source. The effects of electroplating mode, current density, temperature, electrolytic deposition time and pulse form on surface microstructure, phase structure, and depth and silicon content distribution of cross section of coating were investigated. The results show that the coating quality electrodeposited by pulse form is better than that by direct current. The optimum pulse deposition parameters include current density of 750~1000 A/cm2, temperature of 800~850 ℃, t1=t2=0.7~1.5, and electroplating duration of 120~180 min. |
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