Effect of Heat Treatment on Phase Structure, Composition and Resistivity of LaMnO3 Film
Received:May 04, 2015   Revised:May 05, 2015   Accepted:May 11, 2015      Published Online:October 19, 2015
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DOI:doi:10.3969/j.issn.1007-7545.2015.11.014
KeyWord:RF magnetron sputtering; perovskite-type LaMnO3 film; annealing; electrical resistivity
        
AuthorInstitution
Xi Bo 兰州理工大学材料学院;兰州理工大学有色金属先进加工与再利用省部共建国家重点实验室
Zhang Guoqing 兰州理工大学材料学院
Luo Yongchun 兰州理工大学材料学院
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Abstract:
      Perovskite-type LaMnO3 oxide film was prepared by RF magnetron sputtering on Si(100) substrate. The effect of heat treatment on phase structure, composition, morphology, and resistivity was investigated. The results show that LaMnO3 organization starts to decompose when amorphous state annealed at 700 ℃ below and presents impurity phase when annealed at 1 000 ℃ above, while performance of LaMnO3 film changes with temperature and time when annealed at 800~900 ℃. Perovskite-type LaMnO3 oxide film shows the optimal performance when annealed at 800 ℃ for two hours.
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