Study on Resource Utilization of By-product SiCl4 from Polysilicon Industry and Properties of Electrodeposited Silicon Film
Received:March 24, 2017   Revised:March 27, 2017   Accepted:March 29, 2017      Published Online:May 19, 2017
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DOI:doi:10.3969/j.issn.1007-7545.2017.06.017
KeyWord:ionic liquids; SiCl4; C-AFM; silicon thin film; electrical property
           
AuthorInstitution
LIU Jing-jing 上海大学理学院物理系
ZHAO Zhan-xia 上海大学理学院物理系
ZHANG Cheng-long 上海电子废弃物资源化协同创新中心,上海第二工业大学电子废弃物研究中心
MA Zhong-quan 上海大学理学院物理系
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Abstract:
      Silicon film was electrodeposited on titanium plate in three-electrode system. Effect of mass ratio of ionic liquids [BMIM]TF2N to propylene carbonate (PC), electrolyte temperature, and deposition time on electrical property of cathode plate products by C-AFM applying polysilicon industry by-product SiCl4 as solute, [BMIM]TF2N as solvent, and PC as supporting electrolyte were investigated. Effect of silicon thin film structure and surface morphology on its electrical property was studied. Microstructure, surface topography and electrical properties of films were studied by Raman, SEM and I-V, respectively. The results show that cathode deposition film is amorphous silicon film. Silicon film, deposited at room temperature for one hour with mass ratio of [BMIM]TF2N to PC of 1︰3, has uniform structure and good electrical conductivity.
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