Effect of Annealing Temperature on Performance of CZTS Thin Films Prepared via Metal Targets Sequential Sputtering Followed by Sulfuration Technology
Received:August 17, 2017  Revised:August 26, 2017
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DOI:doi:10.3969/j.issn.1007-7545.2018.01.016
KeyWord:sulfide annealing; annealing temperature; CZTS film; crystallization property
                 
AuthorInstitution
liu yike 贵州理工学院材料与冶金工程学院
tang yaqin 贵州理工学院材料与冶金工程学院
zhang kun 中南大学冶金与环境学院
jiang liangxing 中南大学冶金与环境学院
liu fangyang 中南大学冶金与环境学院
lai yanqing 中南大学冶金与环境学院
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Abstract:
      The effects of temperature of sulfide annealing on properties of CZTS thin films based on sequential sputtering from three metal targets were systematically studied by XRD, Raman, SEM, and EDS. The results show that crystallization and morphology of film are enhanced with increase of annealing temperature from 500 ℃ to 580 ℃, but decomposition reaction of CZTS film occurs at 600 ℃, which not only deteriorates crystallization and morphology of film, but also cause losing of Sn element. The optimum sulfide annealing temperature is 580 ℃.
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